Remember Me
Or use your Academic/Social account:


Or use your Academic/Social account:


You have just completed your registration at OpenAire.

Before you can login to the site, you will need to activate your account. An e-mail will be sent to you with the proper instructions.


Please note that this site is currently undergoing Beta testing.
Any new content you create is not guaranteed to be present to the final version of the site upon release.

Thank you for your patience,
OpenAire Dev Team.

Close This Message


Verify Password:
Verify E-mail:
*All Fields Are Required.
Please Verify You Are Human:
fbtwitterlinkedinvimeoflicker grey 14rssslideshare1
Edwards, Gareth T.
Languages: English
Types: Doctoral thesis
Subjects: QC
This thesis describes work undertaken to understand the physics of dry-etching AlGaInP/GaAs laser structures in Cl-based plasmas to develop a process that allows the fabrication of high-aspect-ratio, sub-micron features. The effects of the main process parameters on the etch rate, selectivity and post-etch surface roughness were studied to understand how the interactions between the semiconductor materials and the plasma gives rise to different sidewall geometries. The behaviour of the two types of material in the presence of a Cl-based plasma was found to be very different due to the production of InCb when etching the AlGaInP layers which is absent when etching GaAs. This product is involatile and rate limiting in Cl-rich plasmas. Effective removal of the inhibiting InCb was shown to be necessary to selectively etch the AlGaInP layers anisotropically at a reasonably high etching rate. A narrow range of plasma conditions satisfied these requirements. These conditions provided the thermal- and ion-assisted desorption of the InCh such that the removal rate matches the formation rate. In contrast, GaAs was shown to etch anisotropically under a much wider range of conditions as the mechanism for anisotropic etching does not require an inhibitor. With an optimized set of etch parameters, etching of high-aspect-ratio, sub-micron features in AlGaInP/GaAs laser structures was demonstrated. Despite the difference in etch mechanisms of GaAs and AlGaInP and the use of a 2-step process, at the same Ar fraction vertical sidewall features were achieved in both materials when etching sub-micron gratings. Under conditions that provide smooth vertical sidewalls the etch rate was shown to be aspect-ratio dependent due to the depletion of neutral species at the base of the feature. A range of 1-D gratings were etched with lattice constants as short as 200 nm and aspect ratios as high as 20:1. To the best of my knowledge these are the deepest vertically etched structures on this scale in AlGaInP/GaAs. Using this process, a range of devices including laser cavities defined by dry-etched facets and Distributed Bragg Reflectors and an integrated emitter/detector device were fabricated to demonstrate the quality of the etch process.
  • The results below are discovered through our pilot algorithms. Let us know how we are doing!

    • [1] P.M. Sm ow ton and P. Blood, Visible Emitting (AlGa)InP Laser Diodes, in: M anasreh M O(Ed.). Strained-layer Q uantum Wells and their Applications, Gordon and Breach. 1997, pp 431 -487.
    • [2] T.M. Squires and S.R. Q uake, M icrofluidics: Fluid physics at the nanoliter scale, Review o f M odem Physics, 77. pp977-1026, 2005 .
    • [3] C. Hansen, K. Leung and P. M ousavi, Chipping in to microfluidics, Physics World, 20 (9), pp24-29, 2007.
    • [4] A.Y. Fu, C. Spence, A. Scherer, F.H. A rnold and S.R. Quake, A microfabricated fluorescence-activated cell sorter, N ature Biotechnology, 17, pp 1109-1 111, 1999.
    • [5] A. W olff, I. R. Perch-Nielsen, U. D. Larsen, P. Friis, G. Goranovic, C. R. Poulsen, J. P. R utter and P. Telleman, Integrating advanced functionality in a microfabricated high-throughput fluorescent-activated cell sorter, Lab on a Chip, 3, pp 22-27, 2003. [6 ] Ph. Lalanne and H. Bensity, O ut-of-plane losses o f two-dimensional photonic crystals waveguides: Electrom agnetic analysis, Journal o f Applied Physics, 89(2), p 1512, 2 0 0 1 .
    • [7] L.A. Coldren and S.W. Corzine, D iode Lasers and Photonic Integrated Circuits, W iley Series in M icrowave and Optical Engineering [8 ] D. Sands, Diode Lasers, Institute o f Physics Publishing, Bristol, 2005.
    • [9] Casey and PanishH eterostructure Lasers Part A: Fundamental Principles, Academic Press, 1978.
    • [10] Agrawal and Dutta, Sem iconductor Lasers, Springer, 1993.
    • [11] P. Blood, H eterostructures in sem iconductor lasers, Chapter 7 in Physics and technology o f Heterojunction devices. Edited by D.V. Morgan and R.H.W illiams, Peter Perigrinas, 1991.
    • [12] E. Yablonovitch, Inhibited Spontaneous Emission in Solid-State Physics and Electronics Physical Review Letters, 58, 2059 (1987)
    • [13] J.D. Joannopoulos, R.D. M eade and J.N. Winn, Photonic Crystals, Molding the Flow o f Light, Princeton U niversity Press, N ew Jersey (1995)
    • [14] T.E. Sale, Vertical Cavity Surface Em itting Lasers, Wiley, 1995.
  • No related research data.
  • No similar publications.

Share - Bookmark

Cite this article