LOGIN TO YOUR ACCOUNT

Username
Password
Remember Me
Or use your Academic/Social account:

CREATE AN ACCOUNT

Or use your Academic/Social account:

Congratulations!

You have just completed your registration at OpenAire.

Before you can login to the site, you will need to activate your account. An e-mail will be sent to you with the proper instructions.

Important!

Please note that this site is currently undergoing Beta testing.
Any new content you create is not guaranteed to be present to the final version of the site upon release.

Thank you for your patience,
OpenAire Dev Team.

Close This Message

CREATE AN ACCOUNT

Name:
Username:
Password:
Verify Password:
E-mail:
Verify E-mail:
*All Fields Are Required.
Please Verify You Are Human:
fbtwitterlinkedinvimeoflicker grey 14rssslideshare1
Delcea, BL
Languages: English
Types: Doctoral thesis
Subjects: TJ, other
Ion plating is a fairly new and modern technique for\ud obtaining very adhesive films on any kind of surface and\ud substrate material. The development of electron gun evaporation sources created the possibility to deposit, with high rates, materials having high melting points like : Molybdenum, Tungsten and even Carbon. \ud A part of this work attempts to establish the kind of\ud particles which are involved in ion plating, especially the\ud energetic neutrals that have been considered not to play a\ud major role in the coating process. \ud For this purpose, the ions are separated from the neutrals\ud and their energy spectrums determined using theoretical\ud and experimental methods. The influence of process parameters upon the energies of the ions and neutrals is also studied. \ud Another part of this work is a parametric study of\ud the nucleation of ion plated thin films as compared to\ud the straight vacuum evaporated ones. The film-substrate\ud interface of ion plated films is also analysed and measured\ud attempting to clarify the processes that lead to the\ud formation of a deep grossed interface. \ud Finally a parametric study is carried out with the aim of producing improved film structures in a controlled\ud manner by varying the main process parameters such as :\ud pressure, bias voltage and ion current. The substrate\ud temperature is also considered. A physical model for removing the columnar structure is produced snd reported.
  • No references.
  • No related research data.
  • No similar publications.

Share - Bookmark

Cite this article