LOGIN TO YOUR ACCOUNT

Username
Password
Remember Me
Or use your Academic/Social account:

CREATE AN ACCOUNT

Or use your Academic/Social account:

Congratulations!

You have just completed your registration at OpenAire.

Before you can login to the site, you will need to activate your account. An e-mail will be sent to you with the proper instructions.

Important!

Please note that this site is currently undergoing Beta testing.
Any new content you create is not guaranteed to be present to the final version of the site upon release.

Thank you for your patience,
OpenAire Dev Team.

Close This Message

CREATE AN ACCOUNT

Name:
Username:
Password:
Verify Password:
E-mail:
Verify E-mail:
*All Fields Are Required.
Please Verify You Are Human:
fbtwitterlinkedinvimeoflicker grey 14rssslideshare1
Orcutt, J. S.; Khilo, A.; Stojanovi\'c, V.; Ram, R. J.; Holzwarth, C. W.; Popovi\'c, M. A.; Li, H.; Sun, J.; Bonifield, T.; Hollingsworth, R.; Kärtner, F. X.; Smith, H. I. (2011)
Publisher: Soc.
Languages: English
Types: Article
Subjects: Equipment Failure Analysis, Photons, Equipment Design, instrumentation [Micro-Electrical-Mechanical Systems], instrumentation [Nanotechnology], Computer-Aided Design, Systems Integration, Semiconductors, instrumentation [Refractometry]
ddc: ddc:530

Classified by OpenAIRE into

ACM Ref: Hardware_INTEGRATEDCIRCUITS
We demonstrate a monolithic photonic integration platform that leverages the existing state-of-the-art CMOS foundry infrastructure. In our approach, proven XeF2 post-processing technology and compliance with electronic foundry process flows eliminate the need for specialized substrates or wafer bonding. This approach enables intimate integration of large numbers of nanophotonic devices alongside high-density, high-performance transistors at low initial and incremental cost. We demonstrate this platform by presenting grating-coupled, microring-resonator filter banks fabricated in an unmodified 28 nm bulk-CMOS process by sharing a mask set with standard electronic projects. The lithographic fidelity of this process enables the high-throughput fabrication of second-order, wavelength-division-multiplexing (WDM) filter banks that achieve low insertion loss without post-fabrication trimming.
  • No references.
  • No related research data.
  • No similar publications.

Share - Bookmark

Cite this article

Collected from