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Krywka, Christina; Last, Arndt; Marschall, Felix; Markus, Otto; Georgi, Sebastian; Mueller, Martin; Mohr, Jürgen (2016)
Publisher: Inst.
Languages: English
Types: Article
Subjects: ddc: ddc:530
Identifiers:doi:10.1063/1.4961129
Compound refractive lenses fabricated out of SU-8 negative photoresist have been used to generate a nanofocused, i.e. sub-μm sized X-ray focal spot at an X-ray nanodiffraction setup. X-ray microscopy and X-ray diffraction techniques have conceptually different demands on nanofocusing optical elements and so with the application of X-ray nanodiffraction in mind, this paper presents the results of an initial characterization of polymer lenses used as primary focusing device at an X-ray nanodiffraction synchrotron beamline. A beam size of ~ 600 nm was achieved at a photon energy of 13 keV following only a short initial alignment, with the focal spot representing a demagnified, direct image of the undulator source.

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